| 魏爱丽 ,张晓军.小麦 长穗偃麦草二体代换系（DS3Ee DS4Ee）光合特性研究[J].麦类作物学报,2013,33(4):736 |
| 小麦 长穗偃麦草二体代换系（DS3Ee DS4Ee）光合特性研究 |
| Photosynthetic Characteristics of Disomic Substitution Lines (DS3Ee DS4Ee) of Triticum aestivum cv. Lophopyrum elongatum (Host) A. Lve |
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| DOI：10.7606/j.issn.1009-1041.2013.04.020 |
| 中文关键词: 小麦 小麦 长穗偃麦草代换系 光合特性 |
| 英文关键词:Wheat Disomic substitutions lines (DS3Ee DS4Ee) of Triticum aestivum cv. Chinese Spring（CS） Lophopyrum elongatum (Host) A Lve Photosynthetic characteristics |
| 基金项目:山西省高校科技开发项目（20111022）。 |
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| 中文摘要: |
| 为了确定长穗偃麦草3Ee、4Ee染色体是否含有小麦育种所需要的高光效基因，以小麦中国春 长穗偃麦草二体代换系（DS3Ee、 DS4Ee）为材料，分析了这两种外源染色体导入后小麦光合特性的变化。结果表明，与中国春相比，DS3Ee(3B)、DS4Ee（4A、4B、4D）开花期旗叶光合速率较低，而光合速率高值持续时间较长，其较低的光合速率与其较低的光反应能力(Fv/Fm、ФPSⅡ、ETR)、气孔导度及胞间CO2浓度有关；DS3Ee(3D) 具有较高的光合速率和光合速率高值持续时间，但较高的光合速率与气孔导度和光反应能力无关。 长穗偃麦草3Ee、4Ee可能含有改良小麦光合作用的高光效基因，DS3Ee(3D)在光合速率和光合时间方面可以利用，DS4Ee在光合持续时间方面可以利用。 |
| 英文摘要: |
| Disomic substitution lines (DS3Ee，DS4Ee) of Triticum aestivum cv. Chinese Spring (CS) Lophopyrum elongatum (Host) A. Lve were used as materials to investigate the photosynthetic characteristics of flag leaf using TPS 1 photosynthesis system and FIM 2 chlorophyll fluorescence system. The results showed that photosynthetic rates (Pn) of DS4Ee were lower than CS due to its lower Fv/Fm, ФPSⅡ, ETR and stomatal conductance(GS), but active photosynthesis durations (APD) of DS4Ee were longer than that CS. Pn and APD of DS3Ee(3D) were higher than that of CS, but higher Pn was not related to Fv/Fm, ФPSⅡ, ETR and GS. DS3Ee(3D) maybe used in wheat breeding for improving Pn and APD, and DS4Ee maybe used in wheat breeding for improving APD. |
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